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Artur Wiatrowski, DSc, PhD, Eng
Email: artur.wiatrowski@pwr.edu.pl
Position: Vice-Dean
Unit: Faculty of Electronics, Photonics and Microsystems (N) » Department of Electronic and Photonic Metrology
ul. Janiszewskiego 11/17, 50-372 Wrocław
building C-2, room 105 B
phone +48 71 320 3241
Office hours
- Monday 7.30-9.15 (building C-2, room 111)
- Wednesday 7.30-9.15 (building C-2, room 111)
Research fields
- Thin films deposition; plasma diagnostics; vacuum technique.
Recent papers
2018
- Słówko W., Wiatrowski A., Krysztof M., Detection of secondary and backscattered electrons for 3D imaging with multi-detector method in VP/ESEM. Micron. 2018, vol. 104, s. 45-60.
2017
- Wiatrowski A., Kijaszek W., Posadowski W., Oleszkiewicz W., Jadczak J.N., Kunicki P.M., Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method. Diamond and Related Materials. 2017, vol. 72, s. 71-76.
2016
- Wiatrowski A., Posadowski W., The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters. Materials Science-Poland. 2016, vol. 34, nr 2, s. 374-385.
- Słówko W., Wiatrowski A., Coaxial ion micro-source for VP/ESEM - E-beam impact mode. Vacuum. 2016, vol. 132, s. 53-61.
- Wiatrowski A., Patela S., Kunicki P.M., Posadowski W., Effective reactive pulsed magnetron sputtering of aluminium oxide - Properties of films deposited utilizing automated process stabilizer. Vacuum. 2016, vol. 134, s. 54-62.
2008
- Posadowski W., Wiatrowski A., Dora J., Radzimski Z., Magnetron sputtering process control by medium-frequency power supply parameter. Thin Solid Films. 2008, vol. 516, nr 14, s. 4478-4482.